The PE-75 is our most popular system for use as a plasma asher. Although all of our systems are versatile and can perform many tasks without changing configuration settings, the PE-75 is the best value in the industry for plasma ashing semiconductor wafers.
Plasma ashing is the process of removing photoresist from an etched wafer. Ashing is performed with fluorine or oxygen and is almost always used with a single gas plasma. The versatile PE-75 comes with two gases installed for other cleaning and ashing purposes.
The PE-75 is an entry level plasma treatment system. It's a feature packed, low cost, and robust machine that is perfect for production facilities, research labs, universities, medical facilities, or any industry which needs a small-scale, cost-effective plasma ashing solution. It has all the features of the PE-50 XL but also features a larger chamber size for larger processing applications.
This unit excels at plasma cleaning and surface modification as well as use as a plasma asher.
The PE-75 may also be used in preparing asbestos specimens as a low temperature plasma treatment.
If you are looking for a fully automated solution, our PE-75 Venus plasma asher combines the high value of the PE-75 with fully automated processing. The Venus includes the same laptop control found on our larger systems. |