PE-100 Benchtop Plasma System
 
 
 
 
The PE-100 is a complete plasma treatment solution capable of reactive ion etching, plasma functionalization, and more. This model is perfect for manufacturers, medical facilities, universities, research facilities, or any other company in need of a cost-effective, production-grade plasma processing solution.

The convenient chamber size, along with the availability of high frequency RF power, combine to create a production capable unit small enough to fit nearly anywhere in your lab or production work space.

Full laptop control enables enhanced consistency and complexity of recipes. PC automation also provides ease of use on the production floor.

This model is available in one of three standard configurations:
1) Plasma Cleaning/Plasma Etching
2) Reactive Ion Etching (RIE)
3) Convertible Configuration - Includes both isotropic and anisotropic plasma processing in a single system. Removable tray configuration.
 
Specification
Electrode Configuration Three Stacked Horizontal (9"Wx13"D + 3" Clearance) (Several optional configurations available)
Generator 300W 100KHz Continuously Variable Power Supply
Gas Control One 0-50cc Mass Flow Controller
Vacuum Gauge 1-2000 mT
Vacuum Pump 8CFM 2-Stage Direct Drive Oil Pump with Oil Mist Coalescing Filter (Oxygen Service – Krytox Charged)
Control System

A laptop loaded with Plasma Etch, Inc. software is included for fully automatic system operation, process sequencing, multiple recipe storage, and other advanced features
Chamber Material 6061-T6 Aluminum
Chamber Dimensions 12”x14.5”x12”
Electrical Requirement 120VAC / 60Hz @ 15A or 220VAC / 50Hz @ 14A
Unit Dimensions 17"x28"x30"
Unit Weight 160lbs
Vacuum Pump Weight 68lbs
 
 
Optional Features

Most systems can be customized with a wide range of options including:

Custom Sized Vacuum Chamber, Number/Size of Electrodes
To ensure your system is able to specifically meet your throughput requirements

Reactive Ion Electrodes
Enables reactive ion etching

MHz Power Supplies with Automatic Matching Network
Higher watt/frequency power supplies

Electrostatic Shielding
Significantly increases process uniformity by eliminating excess etching at the outer bounds of the processed material

Temperature Control System
To maintain specific temperatures in the processing chamber for enhanced uniformity and application-specific needs

Dry Vacuum Pump
For more control over the process chamber pressure

Chamber and Vacuum Pump Purge Systems / Air Dryer / Purge Gas Generator
To ensure thorough removal of contaminants from operating equipment, providing uniformity and increasing longevity

Vacuum Pump Oil Mist Eliminator
Captures oil from vacuum pump exhaust

Vacuum Pump Oil Filtration
Filters the vacuum pump oil down to a 3 micron level, increasing the longevity of the oil and the vacuum pump

Automatic Vacuum Control
Provides automation of the process chamber pressure

Additional Digital Mass Flow Controllers
Provides digital automation and monitoring of process gases

Software Configurable Gas Steering Matrix
Designed to allow for up to 5 process gas inputs with 3 selectable at any time

Low Gas-Source Alarm
Notification for when your process gas container needs replenished

Light Tower
For easy visualization of the steps of the plasma processing sequence

Fume Scrubber
To eliminate hazardous fumes/contaminants from the chamber/vacuum pump exhaust
 
 
Download

PE-100 Datasheet

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